Comparative study of quantum mechanical Capacitance Voltage characteristics and threshold voltage of two different structures of Junction Less Nanowire Transistor

Comparative study of quantum mechanical Capacitance Voltage characteristics and threshold voltage of two different structures of Junction Less Nanowire Transistor

This article presented at the IEEE Region 10 Annual International Conference [© 2016 IEEE] and the definite version is available at : https://10.1109/TENCON.2016.7848543. The article website is at: http://ieeexplore.ieee.org/document/7848543/

Detalhes bibliográficos
Main Authors: Tasneem, Nujhat, Adnan, Md. Mohsinur Rahman, Hafiz, Md. Samzid Bin
Outros Autores: Department of Electrical and Electronic Engineering, BRAC University
Formato: Conference paper
Idioma:English
Publicado em: © 2016 IEEE 2017
Assuntos:
Logic gates
Threshold voltage
Capacitance-voltage characteristics
Doping
Silicon
Junction less transistor
Acesso em linha:http://hdl.handle.net/10361/8083
https://10.1109/TENCON.2016.7848543

Internet

http://hdl.handle.net/10361/8083
https://10.1109/TENCON.2016.7848543

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