Cita APA

Erdmann, A. (2021). Optical and EUV Lithography: A Modeling Perspective. SPIE. https://doi.org/10.1117/3.2576902

Citación estilo Chicago

Erdmann, Andreas. Optical and EUV Lithography: A Modeling Perspective. SPIE, 2021. https://doi.org/10.1117/3.2576902.

Cita MLA

Erdmann, Andreas. Optical and EUV Lithography: A Modeling Perspective. SPIE, 2021. https://doi.org/10.1117/3.2576902.

Warning: These citations may not always be 100% accurate.