Levinson, H. J. (2020). Extreme Ultraviolet Lithography. SPIE. https://doi.org/10.1117/3.2581446
Chicago Style aipamenaLevinson, Harry J. Extreme Ultraviolet Lithography. SPIE, 2020. https://doi.org/10.1117/3.2581446.
MLA aipamenaLevinson, Harry J. Extreme Ultraviolet Lithography. SPIE, 2020. https://doi.org/10.1117/3.2581446.
Kontuz: berrikusi erreferentzia hauek erabili aurretik.