Wei, Y. (2009). Advanced Processes for 193-nm Immersion Lithography. SPIE. https://doi.org/10.1117/3.820233
Cita Chicago (17th ed.)Wei, Yayi. Advanced Processes for 193-nm Immersion Lithography. SPIE, 2009. https://doi.org/10.1117/3.820233.
Cita MLA (8th ed.)Wei, Yayi. Advanced Processes for 193-nm Immersion Lithography. SPIE, 2009. https://doi.org/10.1117/3.820233.
Atenció: Aquestes cites poden no estar 100% correctes.