Photomask Japan 2018: XXV Symposium on Photomask and Next-Generation Lithography Mask Technology

Bibliografiske detaljer
Andre forfattere: Takehisa, Kiwamu
Format: Electronisk Bog
Sprog:English
Udgivet: SPIE Digital Library, 7/20/18
Fag:
Online adgang:Full text available on Research4Life (SPIE Digital Library)
Classic Catalogue: View this record in Classic Catalogue
Beskrivelse
Emne beskrivelse:<strong>On-Campus Access Only (IP based access)</strong>
Fysisk beskrivelse:1 online resource
Format:Mode of access: Internet
ISBN:9781510622012
9781510622029
Adgang:Electronic access restricted to authorized BRAC University faculty, staff and students