Photomask Japan 2017: XXIV Symposium on Photomask and Next-Generation Lithography Mask Technology
| Інші автори: | |
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| Формат: | Електронний ресурс Книга |
| Мова: | English |
| Опубліковано: |
SPIE Digital Library,
7/13/17
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| Предмети: | |
| Онлайн доступ: | Full text available on Research4Life (SPIE Digital Library) |
| Classic Catalogue: | View this record in Classic Catalogue |
| Опис примірника: | <strong>On-Campus Access Only (IP based access)</strong> |
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| Фізичний опис: | 1 online resource |
| Формат: | Mode of access: Internet |
| ISBN: | 9781510613898 9781510613904 |
| Доступ: | Electronic access restricted to authorized BRAC University faculty, staff and students |