Photomask Japan 2019: XXVI Symposium on Photomask and Next-Generation Lithography Mask Technology

Bibliographic Details
Other Authors: Ando, Akihiko
Format: Electronic Book
Language:English
Published: SPIE Digital Library, 7/9/19
Subjects:
Online Access:Full text available on Research4Life (SPIE Digital Library)
Classic Catalogue: View this record in Classic Catalogue
Description
Item Description:<strong>On-Campus Access Only (IP based access)</strong>
Physical Description:1 online resource
Format:Mode of access: Internet
ISBN:9781510630734
9781510630741
Access:Electronic access restricted to authorized BRAC University faculty, staff and students