Photomask Japan 2021: XXVII Symposium on Photomask and Next-Generation Lithography Mask Technology

Manylion Llyfryddiaeth
Awduron Eraill: Ando, Akihiko
Fformat: Electronig Llyfr
Iaith:English
Cyhoeddwyd: SPIE Digital Library, 9/17/21
Pynciau:
Mynediad Ar-lein:Full text available on Research4Life (SPIE Digital Library)
Classic Catalogue: View this record in Classic Catalogue
Disgrifiad
Disgrifiad o'r Eitem:<strong>On-Campus Access Only (IP based access)</strong>
Disgrifiad Corfforoll:1 online resource
Fformat:Mode of access: Internet
ISBN:9781510646858
9781510646865
Mynediad:Electronic access restricted to authorized BRAC University faculty, staff and students